SVZ Technologies has developed a new generation of EBIC systems.
The unique feature of the proposed SVZ Technologies EBIC system is related to EBIC/secondary electron image generation. While other systems take control over an electron microscope beam for image generation, thus decreasing sampling rate, the SVZ Technology system uses DIRECT image generation using electron microscope scanning capabilities. The latter approach increases image generation speed up to x2, additionally minimizing sample drift (which is inevitable for longer times of image generation).
Electron beam-induced current 2D image is generated while scanning the sample with metal contact forming a Schottky barrier. The software allows plotting a profile of the current with an axis located across the image in any point or direction (horizontal, vertical, or tilted) and assists in generating a fit in a selected area.
SEM image of the metal contact matches its EBIC image.
a) Ultra Low Noice High-Resolution EBIC Controller
b) Low Noise Low Drift Amplifier/Scanbox
c) SVZ EBIC-2 System Controller