SVZ Technologies has developed a new generation of EBIC systems, featuring a unique approach to EBIC and secondary electron image generation. Unlike other systems that control the electron microscope beam for image generation—resulting in decreased sampling rates—the SVZ Technologies EBIC system employs direct image generation using the electron microscope’s scanning capabilities. This method doubles the image generation speed and significantly minimizes sample drift, which is an inevitable issue during prolonged image generation.
A two-dimensional electron beam-induced current (EBIC) image is generated during the scanning of a sample that features a metal contact forming a Schottky barrier. The software enables the plotting of a current profile along an axis positioned anywhere across the image, in any orientation (horizontal, vertical, or inclined). Additionally, it facilitates the generation of a fit within a user-selected area.
SEM image of the metal contact matches its EBIC image.
a) Ultra Low Noice High-Resolution EBIC Controller
b) Low Noise Low Drift Amplifier/Scanbox
c) SVZ EBIC-2 System Controller